Sub-nanometer scale depth patterning on sapphire crystal by femtosecond soft x-ray laser pulse irradiation.

Damage thresholds and structures on a metal aluminum and an aluminum oxide crystal induced by the soft x-ray free electron laser irradiations were evaluated. Distinctive differences in damage thresholds and structures were observed for these materials. On the aluminum oxide crystal surface, in particular, a novel, to the best of our knowledge, surface processing, which we suggest defining as "peeling," was recognized. Surface structures formed by peeling had extremely shallow patterning of sub-nanometer depth. For the newly observed peeling process, we proposed a scission of chemical bond, i.e., binding energy model, in the crystal.

Damage threshold of LiF crystal irradiated by femtosecond hard XFEL pulse sequence.

Here we demonstrate the results of investigating the damage threshold of a LiF crystal after irradiating it with a sequence of coherent femtosecond pulses using the European X-ray Free Electron Laser (EuXFEL). The laser fluxes on the crystal surface varied in the range ∼ 0.015-13 kJ/cm2 per pulse when irradiated with a sequence of 1-100 pulses (tpulse ∼ 20 fs, Eph = 9 keV). Analysis of the surface of the irradiated crystal using different reading systems allowed the damage areas and the topology of the craters formed to be accurately determined. It was found that the ablation threshold decreases with increasing number of X-ray pulses, while the depth of the formed craters increases non-linearly and reaches several hundred nanometers. The obtained results have been compared with data already available in the literature for nano- and picosecond pulses from lasers in the soft X-ray/VUV and optical ranges. A failure model of lithium fluoride is developed and verified with simulation of material damage under single-pulse irradiation. The obtained damage threshold is in reasonably good agreement with the experimentally measured one.

Independent contribution of optical attenuation length in ultrafast laser-induced structural change.

Although laser irradiation with femtosecond pulses is known to generate crystallization and morphological changes, the contribution of optical parameters to material changes is still in discussion. Here, we compare two structures irradiated near Si-L2,3 edges by an extreme ultraviolet femtosecond pulse. Our result implies that, despite the femtosecond irradiation regime, these values of the optical attenuation length between the wavelengths of 10.3-nm and 13.5-nm differ by one order of magnitude. From the structural comparison, the original crystalline state was maintained upon irradiation at 13.5-nm, on the other hand, transition to an amorphous state occurred at 10.3-nm. The difference in optical attenuation length directly influence to the decision of material crystallization or morphological changes, even if the irradiation condition is under the femtosecond regime and same pulse duration. Our result reveals the contribution of optical attenuation length in ultrafast laser-induced structural change.

Absolute response of a Fuji BAS-TR imaging plate to low-energy protons (<0.2 MeV) and carbon ions (<1 MeV).

This paper reports on the absolute response of a Fuji BAS-TR image plate to relatively low-energy protons (<0.2 MeV) and carbon ions (<1 MeV) accelerated by a 10-TW-class compact high-intensity laser system. A Thomson parabola spectrometer was used to discriminate between different ion species while dispersing the ions according to their kinetic energy. Ion parabolic traces were recorded using an image plate detector overlaid with a slotted CR-39 solid-state detector. The obtained response function for the protons was reasonably extrapolated from previously reported higher-ion-energy response functions. Conversely, the obtained response function for carbon ions was one order of magnitude higher than the value extrapolated from previously reported higher-ion-energy response functions. In a previous study, it was determined that if the stopping range of carbon ions is comparable to or smaller than the grain size of the phosphor, then some ions will provide all their energy to the binder resin rather than the phosphor. As a result, it is believed that the imaging plate response will be reduced. Our results show good agreement with the empirical formula of Lelasseux et al., which does not consider photo-stimulated luminescence (PSL) reduction due to the urethane resin. It was shown that the PSL reduction due to the deactivation of the urethane resin is smaller than that previously predicted.

Compact Thomson parabola spectrometer with variability of energy range and measurability of angular distribution for low-energy laser-driven accelerated ions.

This article reports the development of a compact Thomson parabola spectrometer for laser-accelerated ions that can measure angular distribution with a high energy resolution and has a variable measurable energy range. The angular-resolved energy spectra for different ion species can be measured in a single shot, and the sampling angle can be selected from outside the vacuum region. The electric and magnetic fields are applied to the ion dispersion by using a permanent magnetic circuit and annulus sector-shaped electrodes with a wedge configuration. The compact magnetic circuit consists of permanent magnets, fixed yokes, and movable yokes. The magnetic flux is intentionally leaked to the movable yokes, allowing the magnetic field to be adjusted from 53 mT to 259 mT. The annulus sector-shaped electrodes with a wedge configuration provide better trace separation for high-energy ions, retain the lower-energy part of the ion signal, and subject ions passing through all pinholes to an equivalent Lorentz force. The magnetic and electric fields are designed for measuring protons and carbon ions with an energy range of 0.1-5 MeV. The spectrometer allows for the adjustment of the observable energy range afterward according to the parameters of the accelerated ion.

Surface processing of PMMA and metal nano-particle resist by sub-micrometer focusing of coherent extreme ultraviolet high-order harmonics pulses.

We demonstrate sub-micrometer processing of two kinds of thin films, polymethyl methacrylate (PMMA) and metal nano-particle resist, by focusing high-order harmonics of near-IR femtosecond laser pulses in the extreme ultraviolet (XUV) wavelength region (27.2-34.3 nm) on the thin film samples using an ellipsoidal focusing mirror. The ablation threshold fluences for the PMMA sample and the metal nano-particle resist per XUV pulse obtained by the accumulation of 200 XUV pulses were determined to be 0.42mJ/cm2 and 0.17mJ/cm2, respectively. The diameters (FWHM) of a hole created by the ablation on the PMMA film at the focus were 0.67 µm and 0.44 µm along the horizontal direction and the vertical direction, respectively. The fluence dependence of the Raman microscope spectra of the processed holes on the PMMA sample showed that the chemical modification, in which C=C double bonds are formed associated with the scission of the PMMA polymer chains, is achieved by the irradiation of the XUV pulses.

Soft x-ray laser beamline for surface processing and damage studies.

We have developed a soft x-ray laser (SXRL) beamline equipped with an intensity monitor dedicated to ablation study such as surface processing and damage formation. The SXRL beam having a wavelength of 13.9 nm, pulse width of 7 ps, and pulse energy of around 200 nJ is generated from Ag plasma mediums using an oscillator-amplifier configuration. The SXRL beam is focused onto the sample surface by the Mo/Si multilayer coated spherical mirror. To get the correct irradiation energy/fluence, an intensity monitor composed of a Mo/Si multilayer beam splitter and an x-ray charge-coupled device camera has been installed in the beamline. The Mo/Si multilayer beam splitter has a large polarization dependence in the reflectivity around the incident angle of 45°. However, by evaluating the relationship between reflectivity and transmittance of the beam splitter appropriately, the irradiation energy onto the sample surface can be derived from the energy acquired by the intensity monitor. This SXRL beamline is available to not only the ablation phenomena but also the performance evaluation of soft x-ray optics and resists.

Laser-induced damage thresholds and mechanism of silica glass induced by ultra-short soft x-ray laser pulse irradiation.

Laser-induced damage thresholds (LIDTs) of silica glasses obtained by the femtosecond soft x-ray free-electron laser (SXFEL, 13.5 nm, 70 fs) and the picosecond soft x-ray laser (SXRL, 13.9 nm, 7 ps) are evaluated. The volume of the hydroxyl group in the silica glasses influenced its LIDTs. The LIDTs obtained in this research by the femtosecond SXFEL and the picosecond SXRL were nearly identical, but were different from that by the nanosecond soft x-ray pulse. The photoionization processes of silica glass in context of the laser-induced damage mechanism (LIDM) are also discussed. In the ultra-short soft x-ray pulse irradiation regime, the LIDM can be speculated to include the spallation process with a scission of bondings.

Evaluation of a flat-field grazing incidence spectrometer for highly charged ion plasma emission in soft x-ray spectral region from 1 to 10 nm.

A flat-field grazing incidence spectrometer operating on the spectral region from 1 to 10 nm was built for research on physics of high temperature and high energy density plasmas. It consists of a flat-field grating with 2400 lines/mm as a dispersing element and an x-ray charged coupled device (CCD) camera as the detector. The diffraction efficiency of the grating and the sensitivity of the CCD camera were directly measured by use of synchrotron radiation at the BL-11D beamline of the Photon Factory (PF). The influence of contamination to the spectrometer also was characterized. This result enables us to evaluate the absolute number of photons in a wide range wavelength between 1 and 10 nm within an acquisition. We obtained absolutely calibrated spectra from highly charged ion plasmas of Gd, from which a maximum energy conversion efficiency of 0.26% was observed at a Nd:YAG laser intensity of 3 × 1012 W/cm2.

Note: development of a volume-limited dot target for a high brightness extreme ultraviolet microplasma source.

We report on production of volume-limited dot targets based on electron beam lithographic and sputtering technologies for use in efficient high brightness extreme ultraviolet microplasma sources. We successfully produced cylindrical tin (Sn) targets with diameters of 10, 15, and 20 µm and a height of 150 nm. The calculated spectrum around 13.5 nm was in good agreement with that obtained experimentally.